Improved control in elimination of white impurities on graphene by chemical vapor deposition (CVD)

S. Al-Kamiyani, Tariq Ghulam

Research output: Contribution to journalArticle

Abstract

Chemical vapor deposition (CVD) is one of the most preferred technique of graphene fabrication. However, it still faces some challenges, such as contamination with white particulate impurities which occurs commonly when furnaces with quartz tubes are used in the process. In this work, the source of contamination on copper substrates was traced and tackled in three stages of the graphene fabrication process. The cleaning, annealing, and finally the fabrication stage was studied. No evidence was found to support that copper foil or cleaning tools were sources of the contamination. XPS, EDS and XRD results reveal that the white impurities are silicates, formed due to the phase transition of quartz at elevated temperatures in presence of copper vapor and oxygen gas. It was evident that due to the appearance of this contamination, quartz tubes are not ideal for use in graphene synthesis. However, if unavoidable this study proposes a special substrate configuration which has been found to suppress the contamination during fabrication.

Original languageEnglish
Article number125325
JournalAIP Advances
Volume8
Issue number12
DOIs
Publication statusPublished - Dec 1 2018

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elimination
graphene
contamination
vapor deposition
impurities
fabrication
quartz
copper
cleaning
tubes
particulates
furnaces
foils
silicates
vapors
annealing
oxygen
synthesis
configurations
gases

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Improved control in elimination of white impurities on graphene by chemical vapor deposition (CVD). / Al-Kamiyani, S.; Ghulam, Tariq.

In: AIP Advances, Vol. 8, No. 12, 125325, 01.12.2018.

Research output: Contribution to journalArticle

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