Al doping effect on the morphological, structural and photocatalytic properties of TiO2 thin layers

F. Bensouici*, M. Bououdina, A. A. Dakhel, T. Souier, R. Tala-Ighil, M. Toubane, A. Iratni, S. Liu, W. Cai

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)

Abstract

In this study, Al-doped TiO2 films are deposited by sol-gel dip-coating method. Structure, surface morphology, optical properties and photocatalytic degradation of Methylene blue have been investigated. The films are characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), UV–Visible spectroscopy and scanning electron microscope (SEM) equipped with electron dispersive X-ray (EDX). XRD analysis confirms the formation of single nanocrystalline anatase phase. The crystallite size is in the order of 17 nm and seems not affected by the presence of Al. AFM analysis reveals that the surface topography of TiO2:Al films is significantly affected by Al content. The optical properties are found not affected and all TiO2:Al thin films show high visible infrared transmission and high optical gap energy. The phocatalytic efficiency has been improved by Al doping; with the highest degradation rate of methylene blue observed for TiO2:0.2% Al.

Original languageEnglish
Pages (from-to)655-661
Number of pages7
JournalThin Solid Films
Volume616
DOIs
Publication statusPublished - Oct 1 2016

Keywords

  • Aluminum
  • Anatase
  • Doped titanium dioxide
  • Microstructure
  • Photocatalytic degradation
  • Thin film

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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