Abstract
We investigate the applicability of reverse nanoimprint lithography (RNIL) to fabricate nanostructures. In this method, a thermal ultra-violet (UV) resist is first spin-coated onto a daughter mold directly and then the UV resist is transferred onto the desired surface by a UV-imprinting process at a very low temperature and low pressure. Discrete-track recording media at 50-nm track pitch were fabricated. The images from the scanning electron microscope showed that RNIL is capable of fabricating uniform patterns of nano-scale structures. Several advantages of RNIL over the existing methods are described, including the ease of using low molding pressure and temperature, the speed of imprinting, and the thinner residual layer.
| Original language | English |
|---|---|
| Pages (from-to) | 835-838 |
| Number of pages | 4 |
| Journal | Nanoscience and Nanotechnology Letters |
| Volume | 4 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - Aug 2012 |
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Keywords
- Molding Pressure
- Nanofabrication
- Residual Layer
- Reverse Nanoimprint Lithography
ASJC Scopus subject areas
- Materials Science(all)
Cite this
Reverse nanoimprint lithography for fabrication of nanostructures. / Tavakkoli, A. K G; Ranjbar, M.; Piramanayagam, S. N.; Wong, S. K.; Poh, W. C.; Sbiaa, R.; Chong, T. C.
In: Nanoscience and Nanotechnology Letters, Vol. 4, No. 8, 08.2012, p. 835-838.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Reverse nanoimprint lithography for fabrication of nanostructures
AU - Tavakkoli, A. K G
AU - Ranjbar, M.
AU - Piramanayagam, S. N.
AU - Wong, S. K.
AU - Poh, W. C.
AU - Sbiaa, R.
AU - Chong, T. C.
PY - 2012/8
Y1 - 2012/8
N2 - We investigate the applicability of reverse nanoimprint lithography (RNIL) to fabricate nanostructures. In this method, a thermal ultra-violet (UV) resist is first spin-coated onto a daughter mold directly and then the UV resist is transferred onto the desired surface by a UV-imprinting process at a very low temperature and low pressure. Discrete-track recording media at 50-nm track pitch were fabricated. The images from the scanning electron microscope showed that RNIL is capable of fabricating uniform patterns of nano-scale structures. Several advantages of RNIL over the existing methods are described, including the ease of using low molding pressure and temperature, the speed of imprinting, and the thinner residual layer.
AB - We investigate the applicability of reverse nanoimprint lithography (RNIL) to fabricate nanostructures. In this method, a thermal ultra-violet (UV) resist is first spin-coated onto a daughter mold directly and then the UV resist is transferred onto the desired surface by a UV-imprinting process at a very low temperature and low pressure. Discrete-track recording media at 50-nm track pitch were fabricated. The images from the scanning electron microscope showed that RNIL is capable of fabricating uniform patterns of nano-scale structures. Several advantages of RNIL over the existing methods are described, including the ease of using low molding pressure and temperature, the speed of imprinting, and the thinner residual layer.
KW - Molding Pressure
KW - Nanofabrication
KW - Residual Layer
KW - Reverse Nanoimprint Lithography
UR - http://www.scopus.com/inward/record.url?scp=84865761377&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84865761377&partnerID=8YFLogxK
U2 - 10.1166/nnl.2012.1424
DO - 10.1166/nnl.2012.1424
M3 - Article
VL - 4
SP - 835
EP - 838
JO - Nanoscience and Nanotechnology Letters
JF - Nanoscience and Nanotechnology Letters
SN - 1941-4900
IS - 8
ER -