Reverse nanoimprint lithography for fabrication of nanostructures

A. K G Tavakkoli, M. Ranjbar, S. N. Piramanayagam, S. K. Wong, W. C. Poh, R. Sbiaa, T. C. Chong

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

We investigate the applicability of reverse nanoimprint lithography (RNIL) to fabricate nanostructures. In this method, a thermal ultra-violet (UV) resist is first spin-coated onto a daughter mold directly and then the UV resist is transferred onto the desired surface by a UV-imprinting process at a very low temperature and low pressure. Discrete-track recording media at 50-nm track pitch were fabricated. The images from the scanning electron microscope showed that RNIL is capable of fabricating uniform patterns of nano-scale structures. Several advantages of RNIL over the existing methods are described, including the ease of using low molding pressure and temperature, the speed of imprinting, and the thinner residual layer.

Original languageEnglish
Pages (from-to)835-838
Number of pages4
JournalNanoscience and Nanotechnology Letters
Volume4
Issue number8
DOIs
Publication statusPublished - Aug 2012

Fingerprint

Nanoimprint lithography
Nanostructures
Fabrication
Compression molding
Electron microscopes
Scanning
Temperature

Keywords

  • Molding Pressure
  • Nanofabrication
  • Residual Layer
  • Reverse Nanoimprint Lithography

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Tavakkoli, A. K. G., Ranjbar, M., Piramanayagam, S. N., Wong, S. K., Poh, W. C., Sbiaa, R., & Chong, T. C. (2012). Reverse nanoimprint lithography for fabrication of nanostructures. Nanoscience and Nanotechnology Letters, 4(8), 835-838. https://doi.org/10.1166/nnl.2012.1424

Reverse nanoimprint lithography for fabrication of nanostructures. / Tavakkoli, A. K G; Ranjbar, M.; Piramanayagam, S. N.; Wong, S. K.; Poh, W. C.; Sbiaa, R.; Chong, T. C.

In: Nanoscience and Nanotechnology Letters, Vol. 4, No. 8, 08.2012, p. 835-838.

Research output: Contribution to journalArticle

Tavakkoli, AKG, Ranjbar, M, Piramanayagam, SN, Wong, SK, Poh, WC, Sbiaa, R & Chong, TC 2012, 'Reverse nanoimprint lithography for fabrication of nanostructures', Nanoscience and Nanotechnology Letters, vol. 4, no. 8, pp. 835-838. https://doi.org/10.1166/nnl.2012.1424
Tavakkoli, A. K G ; Ranjbar, M. ; Piramanayagam, S. N. ; Wong, S. K. ; Poh, W. C. ; Sbiaa, R. ; Chong, T. C. / Reverse nanoimprint lithography for fabrication of nanostructures. In: Nanoscience and Nanotechnology Letters. 2012 ; Vol. 4, No. 8. pp. 835-838.
@article{219c7f93d366477ab9e9909e67d9f023,
title = "Reverse nanoimprint lithography for fabrication of nanostructures",
abstract = "We investigate the applicability of reverse nanoimprint lithography (RNIL) to fabricate nanostructures. In this method, a thermal ultra-violet (UV) resist is first spin-coated onto a daughter mold directly and then the UV resist is transferred onto the desired surface by a UV-imprinting process at a very low temperature and low pressure. Discrete-track recording media at 50-nm track pitch were fabricated. The images from the scanning electron microscope showed that RNIL is capable of fabricating uniform patterns of nano-scale structures. Several advantages of RNIL over the existing methods are described, including the ease of using low molding pressure and temperature, the speed of imprinting, and the thinner residual layer.",
keywords = "Molding Pressure, Nanofabrication, Residual Layer, Reverse Nanoimprint Lithography",
author = "Tavakkoli, {A. K G} and M. Ranjbar and Piramanayagam, {S. N.} and Wong, {S. K.} and Poh, {W. C.} and R. Sbiaa and Chong, {T. C.}",
year = "2012",
month = "8",
doi = "10.1166/nnl.2012.1424",
language = "English",
volume = "4",
pages = "835--838",
journal = "Nanoscience and Nanotechnology Letters",
issn = "1941-4900",
publisher = "American Scientific Publishers",
number = "8",

}

TY - JOUR

T1 - Reverse nanoimprint lithography for fabrication of nanostructures

AU - Tavakkoli, A. K G

AU - Ranjbar, M.

AU - Piramanayagam, S. N.

AU - Wong, S. K.

AU - Poh, W. C.

AU - Sbiaa, R.

AU - Chong, T. C.

PY - 2012/8

Y1 - 2012/8

N2 - We investigate the applicability of reverse nanoimprint lithography (RNIL) to fabricate nanostructures. In this method, a thermal ultra-violet (UV) resist is first spin-coated onto a daughter mold directly and then the UV resist is transferred onto the desired surface by a UV-imprinting process at a very low temperature and low pressure. Discrete-track recording media at 50-nm track pitch were fabricated. The images from the scanning electron microscope showed that RNIL is capable of fabricating uniform patterns of nano-scale structures. Several advantages of RNIL over the existing methods are described, including the ease of using low molding pressure and temperature, the speed of imprinting, and the thinner residual layer.

AB - We investigate the applicability of reverse nanoimprint lithography (RNIL) to fabricate nanostructures. In this method, a thermal ultra-violet (UV) resist is first spin-coated onto a daughter mold directly and then the UV resist is transferred onto the desired surface by a UV-imprinting process at a very low temperature and low pressure. Discrete-track recording media at 50-nm track pitch were fabricated. The images from the scanning electron microscope showed that RNIL is capable of fabricating uniform patterns of nano-scale structures. Several advantages of RNIL over the existing methods are described, including the ease of using low molding pressure and temperature, the speed of imprinting, and the thinner residual layer.

KW - Molding Pressure

KW - Nanofabrication

KW - Residual Layer

KW - Reverse Nanoimprint Lithography

UR - http://www.scopus.com/inward/record.url?scp=84865761377&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84865761377&partnerID=8YFLogxK

U2 - 10.1166/nnl.2012.1424

DO - 10.1166/nnl.2012.1424

M3 - Article

AN - SCOPUS:84865761377

VL - 4

SP - 835

EP - 838

JO - Nanoscience and Nanotechnology Letters

JF - Nanoscience and Nanotechnology Letters

SN - 1941-4900

IS - 8

ER -