Abstract
Pure and Cu+2 doped TiO2 thin films have been successfully deposited onto glass substrate by sol–gel dip-coating. The films were annealed at 450 °C for 1 h and characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM-EDX), atomic force microscopy (AFM), UV–vis spectrophotometer and photocatalytic degradation of methylene blue. XRD confirmed the presence of two phases at higher Cu concentration; TiO2 anatase and CuO. AFM analysis showed that the surface roughness increases within increasing Cu content as well as the presence of large aggregates at higher Cu content. SEM observations confirmed the granular structure of the films, and EDX analysis revealed a low solubility limit (effective doping) of Cu into TiO2 lattice. It was found that the optical band gap energy decreases with increasing Cu content. At constant irradiation time, the photo-degradation of methylene blue rate decreased with increasing concentration of Cu+2.
| Original language | English |
|---|---|
| Pages (from-to) | 110-116 |
| Number of pages | 7 |
| Journal | Applied Surface Science |
| Volume | 395 |
| DOIs | |
| Publication status | Published - Feb 15 2017 |
Fingerprint
Keywords
- Anatase TiO
- Cu doped TiO thin films
- Optical properties
- Photocatalytic activity
- Structural properties
ASJC Scopus subject areas
- Surfaces, Coatings and Films
Cite this
Optical, structural and photocatalysis properties of Cu-doped TiO2 thin films. / Bensouici, F.; Bououdina, M.; Dakhel, A. A.; Tala-Ighil, R.; Tounane, M.; Iratni, A.; Souier, T.; Liu, S.; Cai, W.
In: Applied Surface Science, Vol. 395, 15.02.2017, p. 110-116.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Optical, structural and photocatalysis properties of Cu-doped TiO2 thin films
AU - Bensouici, F.
AU - Bououdina, M.
AU - Dakhel, A. A.
AU - Tala-Ighil, R.
AU - Tounane, M.
AU - Iratni, A.
AU - Souier, T.
AU - Liu, S.
AU - Cai, W.
PY - 2017/2/15
Y1 - 2017/2/15
N2 - Pure and Cu+2 doped TiO2 thin films have been successfully deposited onto glass substrate by sol–gel dip-coating. The films were annealed at 450 °C for 1 h and characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM-EDX), atomic force microscopy (AFM), UV–vis spectrophotometer and photocatalytic degradation of methylene blue. XRD confirmed the presence of two phases at higher Cu concentration; TiO2 anatase and CuO. AFM analysis showed that the surface roughness increases within increasing Cu content as well as the presence of large aggregates at higher Cu content. SEM observations confirmed the granular structure of the films, and EDX analysis revealed a low solubility limit (effective doping) of Cu into TiO2 lattice. It was found that the optical band gap energy decreases with increasing Cu content. At constant irradiation time, the photo-degradation of methylene blue rate decreased with increasing concentration of Cu+2.
AB - Pure and Cu+2 doped TiO2 thin films have been successfully deposited onto glass substrate by sol–gel dip-coating. The films were annealed at 450 °C for 1 h and characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM-EDX), atomic force microscopy (AFM), UV–vis spectrophotometer and photocatalytic degradation of methylene blue. XRD confirmed the presence of two phases at higher Cu concentration; TiO2 anatase and CuO. AFM analysis showed that the surface roughness increases within increasing Cu content as well as the presence of large aggregates at higher Cu content. SEM observations confirmed the granular structure of the films, and EDX analysis revealed a low solubility limit (effective doping) of Cu into TiO2 lattice. It was found that the optical band gap energy decreases with increasing Cu content. At constant irradiation time, the photo-degradation of methylene blue rate decreased with increasing concentration of Cu+2.
KW - Anatase TiO
KW - Cu doped TiO thin films
KW - Optical properties
KW - Photocatalytic activity
KW - Structural properties
UR - http://www.scopus.com/inward/record.url?scp=84999748177&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84999748177&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2016.07.034
DO - 10.1016/j.apsusc.2016.07.034
M3 - Article
AN - SCOPUS:84999748177
VL - 395
SP - 110
EP - 116
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
ER -