Novel planarizing scheme for patterned media

Wei Choong Allen Poh, Hang Khume Tan, Lay Ting Ong, Hui Kim Hui, Seng Kai Wong, Kyaw Oo Aung, Eileen Tan, Rachid Sbiaa, Yew Seng Kay, S. N. Piramanayagam

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Abstract

A novel planarization scheme, consisting of compression of a low glass transition temperature (Tg) and low viscosity poly(methyl methacrylate) (PMMA) polymer into grooves of patterned recording media using a surface with flat morphology, has been proposed and investigated. Si (100) surface was used as the smooth surface for pressing PMMA onto the patterned media. Patterned samples prepared with such a planarization method showed very smooth topography of roughness as small as 3 Å (which is comparable to present hard disk media based on continuous film) by atomic force microscope. A magnetic sacrificial layer is proposed in addition as a solution to etching or polishing issues.

Original languageEnglish
Pages (from-to)806-808
Number of pages3
JournalJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Volume28
Issue number4
DOIs
Publication statusPublished - 2010

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ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Poh, W. C. A., Tan, H. K., Ong, L. T., Hui, H. K., Wong, S. K., Aung, K. O., ... Piramanayagam, S. N. (2010). Novel planarizing scheme for patterned media. Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 28(4), 806-808. https://doi.org/10.1116/1.3455497