Nanoimprint mold fabrication and duplication for embedded servo and discrete track recording media

E. L. Tan; K. O. Aung; R. Sbiaa; S. K. Wong; H. K. Tan; W. C. Poh; S. N. Piramanayagam; C. C. Chum

doi:10.1116/1.3225597

Nanoimprint mold fabrication and duplication for embedded servo and discrete track recording media

E. L. Tan, K. O. Aung, R. Sbiaa, S. K. Wong, H. K. Tan, W. C. Poh, S. N. Piramanayagam, C. C. Chum

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

A master mold for nanoimprint lithography was fabricated for discrete track recording (DTR) media using electron beam lithography and conventional etching techniques. The DTR pattern, containing 167 tracks of 120 nm pitch (60 nm land and groove widths) and embedded servo information, was automatically generated using an in-house developed program and was optimized for faster electron beam writing on an x-y stage. A daughter mold was duplicated from the master mold by nanoimprinting, using UV-curable resist and an intermediate polymer stamp technique. Scanning electron microscope images showed that the daughter mold was accurately and completely reproduced from the master mold.

Original language	English
Pages (from-to)	2259-2263
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	27
Issue number	5
DOIs	https://doi.org/10.1116/1.3225597
Publication status	Published - 2009
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.3225597

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@article{9bb6757a5f464f7989f6d564250ca89a,

title = "Nanoimprint mold fabrication and duplication for embedded servo and discrete track recording media",

abstract = "A master mold for nanoimprint lithography was fabricated for discrete track recording (DTR) media using electron beam lithography and conventional etching techniques. The DTR pattern, containing 167 tracks of 120 nm pitch (60 nm land and groove widths) and embedded servo information, was automatically generated using an in-house developed program and was optimized for faster electron beam writing on an x-y stage. A daughter mold was duplicated from the master mold by nanoimprinting, using UV-curable resist and an intermediate polymer stamp technique. Scanning electron microscope images showed that the daughter mold was accurately and completely reproduced from the master mold.",

author = "Tan, {E. L.} and Aung, {K. O.} and R. Sbiaa and Wong, {S. K.} and Tan, {H. K.} and Poh, {W. C.} and Piramanayagam, {S. N.} and Chum, {C. C.}",

year = "2009",

doi = "10.1116/1.3225597",

language = "English",

volume = "27",

pages = "2259--2263",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "5",

}

TY - JOUR

T1 - Nanoimprint mold fabrication and duplication for embedded servo and discrete track recording media

AU - Tan, E. L.

AU - Aung, K. O.

AU - Sbiaa, R.

AU - Wong, S. K.

AU - Tan, H. K.

AU - Poh, W. C.

AU - Piramanayagam, S. N.

AU - Chum, C. C.

PY - 2009

Y1 - 2009

N2 - A master mold for nanoimprint lithography was fabricated for discrete track recording (DTR) media using electron beam lithography and conventional etching techniques. The DTR pattern, containing 167 tracks of 120 nm pitch (60 nm land and groove widths) and embedded servo information, was automatically generated using an in-house developed program and was optimized for faster electron beam writing on an x-y stage. A daughter mold was duplicated from the master mold by nanoimprinting, using UV-curable resist and an intermediate polymer stamp technique. Scanning electron microscope images showed that the daughter mold was accurately and completely reproduced from the master mold.

AB - A master mold for nanoimprint lithography was fabricated for discrete track recording (DTR) media using electron beam lithography and conventional etching techniques. The DTR pattern, containing 167 tracks of 120 nm pitch (60 nm land and groove widths) and embedded servo information, was automatically generated using an in-house developed program and was optimized for faster electron beam writing on an x-y stage. A daughter mold was duplicated from the master mold by nanoimprinting, using UV-curable resist and an intermediate polymer stamp technique. Scanning electron microscope images showed that the daughter mold was accurately and completely reproduced from the master mold.

UR - http://www.scopus.com/inward/record.url?scp=70349685082&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=70349685082&partnerID=8YFLogxK

U2 - 10.1116/1.3225597

DO - 10.1116/1.3225597

M3 - Article

AN - SCOPUS:70349685082

SN - 1071-1023

VL - 27

SP - 2259

EP - 2263

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 5

ER -

Nanoimprint mold fabrication and duplication for embedded servo and discrete track recording media

Abstract

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