A master mold for nanoimprint lithography was fabricated for discrete track recording (DTR) media using electron beam lithography and conventional etching techniques. The DTR pattern, containing 167 tracks of 120 nm pitch (60 nm land and groove widths) and embedded servo information, was automatically generated using an in-house developed program and was optimized for faster electron beam writing on an x-y stage. A daughter mold was duplicated from the master mold by nanoimprinting, using UV-curable resist and an intermediate polymer stamp technique. Scanning electron microscope images showed that the daughter mold was accurately and completely reproduced from the master mold.
|Number of pages||5|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|Publication status||Published - 2009|
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering