Nanoimprint mold fabrication and duplication for embedded servo and discrete track recording media

E. L. Tan, K. O. Aung, R. Sbiaa, S. K. Wong, H. K. Tan, W. C. Poh, S. N. Piramanayagam, C. C. Chum

Research output: Contribution to journalArticle

12 Citations (Scopus)


A master mold for nanoimprint lithography was fabricated for discrete track recording (DTR) media using electron beam lithography and conventional etching techniques. The DTR pattern, containing 167 tracks of 120 nm pitch (60 nm land and groove widths) and embedded servo information, was automatically generated using an in-house developed program and was optimized for faster electron beam writing on an x-y stage. A daughter mold was duplicated from the master mold by nanoimprinting, using UV-curable resist and an intermediate polymer stamp technique. Scanning electron microscope images showed that the daughter mold was accurately and completely reproduced from the master mold.

Original languageEnglish
Pages (from-to)2259-2263
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number5
Publication statusPublished - 2009


ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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