Mn fraction substitutional site and defects induced magnetism in Mn-implanted 6H-SiC

K. Bouziane, M. Al Azri, M. Elzain, S. M. Chérif, M. Mamor, A. Declémy, L. Thomé

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

n-type 6H-SiC (0 0 0 1) single crystal substrates were implanted with three fluences of manganese (Mn+) ions: 5 × 1015, 1 × 1016 and 5 × 1016 cm-2 with implantation energy of 80 keV at 365 °C to stimulate dynamic annealing. The samples were characterized using Rutherford backscattering channeling spectroscopy (RBS/C), high-resolution X-ray diffraction technique (HRXRD), and Superconducting Quantum Interference Device (SQUID) techniques. Two main defect regions have been identified using RBS/C spectra fitted with the McChasy code combined to SRIM simulations. Intermediate defects depth region is associated with vacancies (DV) and deeper defect (DN) essentially related to the Si and C interstitial defects. The defect concentration and the maximum perpendicular strain exhibit similar increasing trend with the Mn+ fluence. Furthermore, the amount of Mn atoms at Si substitutional sites and the corresponding magnetic moment per Mn atom were found to increase with increasing Mn fluence from 0.7 μB to 1.7 μB and then collapsing to 0.2 μB. Moreover, a strong correlation has been found between the magnetic moment and the combination of both large DV/DN ratio and high Mn at Si sites. These results are corroborated by our ab initio calculations considering the most stable configurations showing that besides the amount of Mn substituting Si sites, local vacancy-rich environment is playing a crucial role in enhancing the magnetism.

Original languageEnglish
Pages (from-to)760-765
Number of pages6
JournalJournal of Alloys and Compounds
Volume632
DOIs
Publication statusPublished - May 25 2015

Fingerprint

Magnetism
Defects
Rutherford backscattering spectroscopy
Magnetic moments
Vacancies
Atoms
SQUIDs
Manganese
Single crystals
Annealing
Ions
X ray diffraction
Substrates

Keywords

  • 6H-SiC
  • Ab initio
  • Defects
  • Dilute magnetic semiconductor
  • Magnetism
  • Mn-implanted

ASJC Scopus subject areas

  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Chemistry
  • Metals and Alloys

Cite this

Mn fraction substitutional site and defects induced magnetism in Mn-implanted 6H-SiC. / Bouziane, K.; Al Azri, M.; Elzain, M.; Chérif, S. M.; Mamor, M.; Declémy, A.; Thomé, L.

In: Journal of Alloys and Compounds, Vol. 632, 25.05.2015, p. 760-765.

Research output: Contribution to journalArticle

Bouziane, K. ; Al Azri, M. ; Elzain, M. ; Chérif, S. M. ; Mamor, M. ; Declémy, A. ; Thomé, L. / Mn fraction substitutional site and defects induced magnetism in Mn-implanted 6H-SiC. In: Journal of Alloys and Compounds. 2015 ; Vol. 632. pp. 760-765.
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abstract = "n-type 6H-SiC (0 0 0 1) single crystal substrates were implanted with three fluences of manganese (Mn+) ions: 5 × 1015, 1 × 1016 and 5 × 1016 cm-2 with implantation energy of 80 keV at 365 °C to stimulate dynamic annealing. The samples were characterized using Rutherford backscattering channeling spectroscopy (RBS/C), high-resolution X-ray diffraction technique (HRXRD), and Superconducting Quantum Interference Device (SQUID) techniques. Two main defect regions have been identified using RBS/C spectra fitted with the McChasy code combined to SRIM simulations. Intermediate defects depth region is associated with vacancies (DV) and deeper defect (DN) essentially related to the Si and C interstitial defects. The defect concentration and the maximum perpendicular strain exhibit similar increasing trend with the Mn+ fluence. Furthermore, the amount of Mn atoms at Si substitutional sites and the corresponding magnetic moment per Mn atom were found to increase with increasing Mn fluence from 0.7 μB to 1.7 μB and then collapsing to 0.2 μB. Moreover, a strong correlation has been found between the magnetic moment and the combination of both large DV/DN ratio and high Mn at Si sites. These results are corroborated by our ab initio calculations considering the most stable configurations showing that besides the amount of Mn substituting Si sites, local vacancy-rich environment is playing a crucial role in enhancing the magnetism.",
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T1 - Mn fraction substitutional site and defects induced magnetism in Mn-implanted 6H-SiC

AU - Bouziane, K.

AU - Al Azri, M.

AU - Elzain, M.

AU - Chérif, S. M.

AU - Mamor, M.

AU - Declémy, A.

AU - Thomé, L.

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N2 - n-type 6H-SiC (0 0 0 1) single crystal substrates were implanted with three fluences of manganese (Mn+) ions: 5 × 1015, 1 × 1016 and 5 × 1016 cm-2 with implantation energy of 80 keV at 365 °C to stimulate dynamic annealing. The samples were characterized using Rutherford backscattering channeling spectroscopy (RBS/C), high-resolution X-ray diffraction technique (HRXRD), and Superconducting Quantum Interference Device (SQUID) techniques. Two main defect regions have been identified using RBS/C spectra fitted with the McChasy code combined to SRIM simulations. Intermediate defects depth region is associated with vacancies (DV) and deeper defect (DN) essentially related to the Si and C interstitial defects. The defect concentration and the maximum perpendicular strain exhibit similar increasing trend with the Mn+ fluence. Furthermore, the amount of Mn atoms at Si substitutional sites and the corresponding magnetic moment per Mn atom were found to increase with increasing Mn fluence from 0.7 μB to 1.7 μB and then collapsing to 0.2 μB. Moreover, a strong correlation has been found between the magnetic moment and the combination of both large DV/DN ratio and high Mn at Si sites. These results are corroborated by our ab initio calculations considering the most stable configurations showing that besides the amount of Mn substituting Si sites, local vacancy-rich environment is playing a crucial role in enhancing the magnetism.

AB - n-type 6H-SiC (0 0 0 1) single crystal substrates were implanted with three fluences of manganese (Mn+) ions: 5 × 1015, 1 × 1016 and 5 × 1016 cm-2 with implantation energy of 80 keV at 365 °C to stimulate dynamic annealing. The samples were characterized using Rutherford backscattering channeling spectroscopy (RBS/C), high-resolution X-ray diffraction technique (HRXRD), and Superconducting Quantum Interference Device (SQUID) techniques. Two main defect regions have been identified using RBS/C spectra fitted with the McChasy code combined to SRIM simulations. Intermediate defects depth region is associated with vacancies (DV) and deeper defect (DN) essentially related to the Si and C interstitial defects. The defect concentration and the maximum perpendicular strain exhibit similar increasing trend with the Mn+ fluence. Furthermore, the amount of Mn atoms at Si substitutional sites and the corresponding magnetic moment per Mn atom were found to increase with increasing Mn fluence from 0.7 μB to 1.7 μB and then collapsing to 0.2 μB. Moreover, a strong correlation has been found between the magnetic moment and the combination of both large DV/DN ratio and high Mn at Si sites. These results are corroborated by our ab initio calculations considering the most stable configurations showing that besides the amount of Mn substituting Si sites, local vacancy-rich environment is playing a crucial role in enhancing the magnetism.

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