TY - JOUR
T1 - Magnetic properties of antidots in conventional and spin-reoriented antiferromagnetically coupled layers
AU - Ranjbar, M.
AU - Piramanayagam, S. N.
AU - Sbiaa, R.
AU - Chong, T. C.
N1 - Funding Information:
M.R. would like to express gratitude for support from the A*STAR (SINGA) Graduate Scholarship program.
PY - 2012/4/1
Y1 - 2012/4/1
N2 - Antiferromagnetically coupled (AFC) patterned media technology is one approach to reduce dipolar interactions and thus minimize the switching field distribution (SFD) in bit-patterned media. Achieving anti-parallel alignment of magnetic moments at remanence requires a large exchange coupling field (H ex), especially in patterned nanostructures, which exhibit a large enhancement in coercivity after patterning. In our work, we observed a very high H ex of more than 15 kOe in Co thin film antiferromagnetically coupled to (Co/Pd) multilayers with a high perpendicular magnetic anisotropy (PMA). In contrast, an H ex of only 380 Oe was measured in the case of (Co/Pd) multilayers of the type [Co (0.4 nm)/Pd (0.8 nm)] 3 antiferromagnetically coupled with (Co/Pd) multilayers with a high PMA. The effect of H ex on SFD of patterned structures was investigated, and it was found that SFD can be reduced in AFC patterned films with a high H ex.
AB - Antiferromagnetically coupled (AFC) patterned media technology is one approach to reduce dipolar interactions and thus minimize the switching field distribution (SFD) in bit-patterned media. Achieving anti-parallel alignment of magnetic moments at remanence requires a large exchange coupling field (H ex), especially in patterned nanostructures, which exhibit a large enhancement in coercivity after patterning. In our work, we observed a very high H ex of more than 15 kOe in Co thin film antiferromagnetically coupled to (Co/Pd) multilayers with a high perpendicular magnetic anisotropy (PMA). In contrast, an H ex of only 380 Oe was measured in the case of (Co/Pd) multilayers of the type [Co (0.4 nm)/Pd (0.8 nm)] 3 antiferromagnetically coupled with (Co/Pd) multilayers with a high PMA. The effect of H ex on SFD of patterned structures was investigated, and it was found that SFD can be reduced in AFC patterned films with a high H ex.
UR - http://www.scopus.com/inward/record.url?scp=84861721848&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84861721848&partnerID=8YFLogxK
U2 - 10.1063/1.3679602
DO - 10.1063/1.3679602
M3 - Article
AN - SCOPUS:84861721848
SN - 0021-8979
VL - 111
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 7
M1 - 07B921
ER -