Electron beam fabrication of scatter plate for scatter plate interferometer

J. Räsänen; K. M. Abedin; K. Tenjimbayashi; T. Eiju; K. Matsuda; K. E. Peiponen

doi:10.1016/S0030-4018(97)00326-X

Electron beam fabrication of scatter plate for scatter plate interferometer

J. Räsänen^*, K. M. Abedin, K. Tenjimbayashi, T. Eiju, K. Matsuda, K. E. Peiponen

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

We have fabricated a computer-generated point symmetrical scatter plate with a negligible symmetry error for a scatter plate interferometer using electron beam writing equipment. The feature size of the scatterers in the scatter plate was 5 μm. The small scatterer size permits to test small f-number mirrors since the scattering angle of the light is large. This is the first example of such a fabrication of a scatter plate for the scatter plate interferometer. In this paper the advantages of the electron beam writing of a scatter plate are discussed and interferometric experiments are presented.

Original language	English
Pages (from-to)	1-4
Number of pages	4
Journal	Optics Communications
Volume	143
Issue number	1-3
DOIs	https://doi.org/10.1016/S0030-4018(97)00326-X
Publication status	Published - Nov 1 1997
Externally published	Yes

Keywords

Electron beam writing
Scatter plate interferometer

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Physical and Theoretical Chemistry
Electrical and Electronic Engineering

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10.1016/S0030-4018(97)00326-X

Cite this

@article{f721ee210e704cca9fb6c643dab76527,

title = "Electron beam fabrication of scatter plate for scatter plate interferometer",

abstract = "We have fabricated a computer-generated point symmetrical scatter plate with a negligible symmetry error for a scatter plate interferometer using electron beam writing equipment. The feature size of the scatterers in the scatter plate was 5 μm. The small scatterer size permits to test small f-number mirrors since the scattering angle of the light is large. This is the first example of such a fabrication of a scatter plate for the scatter plate interferometer. In this paper the advantages of the electron beam writing of a scatter plate are discussed and interferometric experiments are presented.",

keywords = "Electron beam writing, Scatter plate interferometer",

author = "J. R{\"a}s{\"a}nen and Abedin, {K. M.} and K. Tenjimbayashi and T. Eiju and K. Matsuda and Peiponen, {K. E.}",

note = "Funding Information: One of the authors( K.-E. Peiponen) wishes to express his gratitude to the Academy of Finland for financial support.",

year = "1997",

month = nov,

day = "1",

doi = "10.1016/S0030-4018(97)00326-X",

language = "English",

volume = "143",

pages = "1--4",

journal = "Optics Communications",

issn = "0030-4018",

publisher = "Elsevier",

number = "1-3",

}

TY - JOUR

T1 - Electron beam fabrication of scatter plate for scatter plate interferometer

AU - Räsänen, J.

AU - Abedin, K. M.

AU - Tenjimbayashi, K.

AU - Eiju, T.

AU - Matsuda, K.

AU - Peiponen, K. E.

N1 - Funding Information: One of the authors( K.-E. Peiponen) wishes to express his gratitude to the Academy of Finland for financial support.

PY - 1997/11/1

Y1 - 1997/11/1

N2 - We have fabricated a computer-generated point symmetrical scatter plate with a negligible symmetry error for a scatter plate interferometer using electron beam writing equipment. The feature size of the scatterers in the scatter plate was 5 μm. The small scatterer size permits to test small f-number mirrors since the scattering angle of the light is large. This is the first example of such a fabrication of a scatter plate for the scatter plate interferometer. In this paper the advantages of the electron beam writing of a scatter plate are discussed and interferometric experiments are presented.

AB - We have fabricated a computer-generated point symmetrical scatter plate with a negligible symmetry error for a scatter plate interferometer using electron beam writing equipment. The feature size of the scatterers in the scatter plate was 5 μm. The small scatterer size permits to test small f-number mirrors since the scattering angle of the light is large. This is the first example of such a fabrication of a scatter plate for the scatter plate interferometer. In this paper the advantages of the electron beam writing of a scatter plate are discussed and interferometric experiments are presented.

KW - Electron beam writing

KW - Scatter plate interferometer

UR - http://www.scopus.com/inward/record.url?scp=0031270527&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031270527&partnerID=8YFLogxK

U2 - 10.1016/S0030-4018(97)00326-X

DO - 10.1016/S0030-4018(97)00326-X

M3 - Article

AN - SCOPUS:0031270527

SN - 0030-4018

VL - 143

SP - 1

EP - 4

JO - Optics Communications

JF - Optics Communications

IS - 1-3

ER -

Electron beam fabrication of scatter plate for scatter plate interferometer

Abstract

Keywords

ASJC Scopus subject areas

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