Electron beam fabrication of scatter plate for scatter plate interferometer

J. Räsänen, K. M. Abedin, K. Tenjimbayashi, T. Eiju, K. Matsuda, K. E. Peiponen

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We have fabricated a computer-generated point symmetrical scatter plate with a negligible symmetry error for a scatter plate interferometer using electron beam writing equipment. The feature size of the scatterers in the scatter plate was 5 μm. The small scatterer size permits to test small f-number mirrors since the scattering angle of the light is large. This is the first example of such a fabrication of a scatter plate for the scatter plate interferometer. In this paper the advantages of the electron beam writing of a scatter plate are discussed and interferometric experiments are presented.

Original languageEnglish
Pages (from-to)1-4
Number of pages4
JournalOptics Communications
Volume143
Issue number1-3
Publication statusPublished - Nov 1 1997

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Keywords

  • Electron beam writing
  • Scatter plate interferometer

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Physical and Theoretical Chemistry
  • Electrical and Electronic Engineering

Cite this

Räsänen, J., Abedin, K. M., Tenjimbayashi, K., Eiju, T., Matsuda, K., & Peiponen, K. E. (1997). Electron beam fabrication of scatter plate for scatter plate interferometer. Optics Communications, 143(1-3), 1-4.