Rapid thermal annealing: An efficient method to improve the electrical properties of tellurium compensated Interfacial Misfit GaSb/GaAs heterostructures

Mohsin Aziz, Jorlandio F. Felix, Dler Jameel, Noor Al Saqri, Faisal S. Al Mashary, Haifaa M. Alghamdi, Hind M.A. Albalawi, David Taylor, Mohamed Henini*

*المؤلف المقابل لهذا العمل

نتاج البحث: المساهمة في مجلةArticleمراجعة النظراء

5 اقتباسات (Scopus)

ملخص

The effect of thermal annealing on Te compensated Interfacial Misfit GaSb/GaAs heterostructures is investigated by using two different thermal annealing procedures, namely rapid thermal annealing and furnace annealing. The electrical properties of the devices are studied by using Current-Voltage, Capacitance-Voltage and Deep Level Transient Spectroscopy techniques. It is observed that rapid thermal annealing treatment is superior in terms of improvement of the electrical characteristics compared to furnace annealing treatment. The lowest leakage current and defect concentration are obtained when rapid thermal annealing is employed.

اللغة الأصليةEnglish
الصفحات (من إلى)80-89
عدد الصفحات10
دوريةSuperlattices and Microstructures
مستوى الصوت88
المعرِّفات الرقمية للأشياء
حالة النشرPublished - ديسمبر 1 2015
منشور خارجيًانعم

ASJC Scopus subject areas

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  • ???subjectarea.asjc.3100.3104???
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بصمة

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