TY - JOUR
T1 - Planarization of patterned recording media
AU - Piramanayagam, S. N.
AU - Sbiaa, Rachid
AU - Tan, Ei Leen
AU - Poh, Allen Wei Choong
AU - Tan, Hang Khume
AU - Aung, Kyaw Oo
AU - Zhao, Jinmin
AU - Wong, Seng Kai
PY - 2010/3
Y1 - 2010/3
N2 - The planarization of patterned recording media is essential to overcome the "flying height reduction" and "flying instability" of the head-slider. This paper reports two planarization techniques; one by compressing a morphological smooth surface onto a low glass transition temperature T g /UV curable polymer/material coated patterned sample, while the other employs spin coating to coat patterned disks. A roughness of 0.3 nm was achieved by planarization using compression of smooth Si onto 35 K PMMA (heated above Tg to decrease its viscosity). It was also found that decreasing the spin speed from 5000 rpm to 1000 rpm improves the filling of grooves using spin coating of hydrogen silsesquioxane (HSQ) decreasing the height difference between the filled groove region and the land region from about 6 nm to 4 nm. Initial investigation using compression of smooth Si onto diluted HSQ also shows a decrease of roughness as dilution increases from 50.0% to 66.6%. Both techniques were applied in the planarization of a UV curable resist. The results show that about 1 nm is observed between the patterned and unpatterned regions using only spin coating. However, with compression using a flat mold, no height difference on average is observed.
AB - The planarization of patterned recording media is essential to overcome the "flying height reduction" and "flying instability" of the head-slider. This paper reports two planarization techniques; one by compressing a morphological smooth surface onto a low glass transition temperature T g /UV curable polymer/material coated patterned sample, while the other employs spin coating to coat patterned disks. A roughness of 0.3 nm was achieved by planarization using compression of smooth Si onto 35 K PMMA (heated above Tg to decrease its viscosity). It was also found that decreasing the spin speed from 5000 rpm to 1000 rpm improves the filling of grooves using spin coating of hydrogen silsesquioxane (HSQ) decreasing the height difference between the filled groove region and the land region from about 6 nm to 4 nm. Initial investigation using compression of smooth Si onto diluted HSQ also shows a decrease of roughness as dilution increases from 50.0% to 66.6%. Both techniques were applied in the planarization of a UV curable resist. The results show that about 1 nm is observed between the patterned and unpatterned regions using only spin coating. However, with compression using a flat mold, no height difference on average is observed.
KW - Index Terms-Hard disk media
KW - Patterned recording medium
KW - Planarization
KW - Tribology
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U2 - 10.1109/TMAG.2009.2039018
DO - 10.1109/TMAG.2009.2039018
M3 - Article
AN - SCOPUS:80052318765
SN - 0018-9464
VL - 46
SP - 758
EP - 763
JO - IEEE Transactions on Magnetics
JF - IEEE Transactions on Magnetics
IS - 3 PART 1
ER -