TY - JOUR
T1 - Electron beam fabrication of scatter plate for scatter plate interferometer
AU - Räsänen, J.
AU - Abedin, K. M.
AU - Tenjimbayashi, K.
AU - Eiju, T.
AU - Matsuda, K.
AU - Peiponen, K. E.
N1 - Funding Information:
One of the authors( K.-E. Peiponen) wishes to express his gratitude to the Academy of Finland for financial support.
PY - 1997/11/1
Y1 - 1997/11/1
N2 - We have fabricated a computer-generated point symmetrical scatter plate with a negligible symmetry error for a scatter plate interferometer using electron beam writing equipment. The feature size of the scatterers in the scatter plate was 5 μm. The small scatterer size permits to test small f-number mirrors since the scattering angle of the light is large. This is the first example of such a fabrication of a scatter plate for the scatter plate interferometer. In this paper the advantages of the electron beam writing of a scatter plate are discussed and interferometric experiments are presented.
AB - We have fabricated a computer-generated point symmetrical scatter plate with a negligible symmetry error for a scatter plate interferometer using electron beam writing equipment. The feature size of the scatterers in the scatter plate was 5 μm. The small scatterer size permits to test small f-number mirrors since the scattering angle of the light is large. This is the first example of such a fabrication of a scatter plate for the scatter plate interferometer. In this paper the advantages of the electron beam writing of a scatter plate are discussed and interferometric experiments are presented.
KW - Electron beam writing
KW - Scatter plate interferometer
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U2 - 10.1016/S0030-4018(97)00326-X
DO - 10.1016/S0030-4018(97)00326-X
M3 - Article
AN - SCOPUS:0031270527
SN - 0030-4018
VL - 143
SP - 1
EP - 4
JO - Optics Communications
JF - Optics Communications
IS - 1-3
ER -